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Chemical process design and simulation : Aspen Plus and Aspen Hysys applications / Juma Haydary.
Material type:
TextPublication details: New York : American Institute of Chemical Engineers ; John Wiley & Sons, Inc., c2019.Description: xliv, 391 p. : ill. ; 29 cmISBN: - 9781119089117
- 660.2812 HAY 23
| Item type | Current library | Call number | Copy number | Status | Barcode | |
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Books
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Central Library, KUET On Display | 660.2812 HAY (Browse shelf(Opens below)) | 01 | Not For Loan | 3010062856 | |
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Books
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Central Library, KUET On Display | 660.2812 HAY (Browse shelf(Opens below)) | 02 | Not For Loan | 3010062857 |
Total holds: 0
Includes bibliographical references and index.
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